IRPC 2022: Tackling the dual challenge through AI enabled advanced control
Alex Kalafatis, Senior Director, Product Management for Aspen Technology delivered a presentation titled, “Tackling the Dual Challenge through AI Enabled Advanced Control and Optimization,” at IRPC 2022 in Houston, Texas. Kalafatis examined the path to greater operational autonomy fueled by industrial AI. He addressed the dual challenge of maximizing profits, while improving efficiency and reducing waste.
Kalafatis ended his presentation with the mention of Aspen Technology’s vision for a self-optimizing plant equipped with self-learning, self-adapting and self-sustaining technology. The goal is technologies and processes that work together to predict future state and prescribe or automate actions to help meet sustainability and profitability goals.
Related News
- ASRock Industrial and CSI Validate O-PAS™ Systems Management Architecture with the iEP-7020E and AiSMA
- BASF and Avery Dennison collaborate to launch BASF’s newest acrylates based on renewable electricity: Butyl acrylate RE and 2-Ethylhexyl acrylate RE
- Ketjen and Aramco collaborate to support the development of next-generation FCC catalyst innovation


Comments